Interaction of novolak oligomers with hydrogen bond acceptors

Tung-Feng Yeh; Jian Ping Huang; Arnost Reiser; Kenji Honda; Bernard T. Beauchemin Jr.; Rodney J. Hurditch

doi:10.1117/12.175379

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16 May 1994 Interaction of novolak oligomers with hydrogen bond acceptors

Tung-Feng Yeh, Jian Ping Huang, Arnost Reiser, Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch

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Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175379
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Hydrogen bonding between several novolak oligomers as donors and phenylsulfoxide as acceptor was investigated as a model for the interaction of inhibitors with o,o-connected phenolic blocks in practical novolak resins. It was found that the attraction of the novolak dimer for the acceptor was more than twice as strong as that of the corresponding monomeric phenol. In a non-polar solvent, carbon tetrachloride, the higher oligomers assume cyclic conformations where all hydrogen bonds are internally saturated. There are, however, indications, that in sufficiently polar solvents these cyclic structures open up and that the acyclic oligomers then interact strongly with hydrogen bond acceptors.

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Tung-Feng Yeh, Jian Ping Huang, Arnost Reiser, Kenji Honda, Bernard T. Beauchemin Jr., and Rodney J. Hurditch "Interaction of novolak oligomers with hydrogen bond acceptors", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175379

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