Transparent photoacid generator (ALS) for ArF excimer laser lithography and chemically amplified resist

Kaichiro Nakano; Katsumi Maeda; Shigeyuki Iwasa; Jun-ichi Yano; Yukio Ogura; Etsuo Hasegawa

doi:10.1117/12.175336

16 May 1994 Transparent photoacid generator (ALS) for ArF excimer laser lithography and chemically amplified resist

Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa, Jun-ichi Yano, Yukio Ogura, Etsuo Hasegawa

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175336
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A novel photoacid generator, ALS (alkylsulfonium salt; cyclohexylmethyl(2-oxocyclohexyl)sulfonium trifluoromethane- sulfonate) for ArF excimer laser ((lambda) equals193 nm) lithography and a single-layer resist have been developed. ALS shows high transparency at 193 nm and photoacid generating capability on irradiation by ArF excimer laser. A novel methacrylate terpolymer, poly(tricyclo[5.2.1.0^2,6]decanylmethacrylate-co-2- tetrahydropyranylmethacrylate-co-methacrylic acid), is synthesized as a base resin. The resist, consisting of ALS and the polymer, shows chemical amplification and good resolution. A 0.2-micrometers line and space negative-tone image is observed at 15 mJ/cm² dose using an ArF excimer laser.

Citation Download Citation

Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa, Jun-ichi Yano, Yukio Ogura, and Etsuo Hasegawa "Transparent photoacid generator (ALS) for ArF excimer laser lithography and chemically amplified resist", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175336

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