Effects of dissimilar materials on submicron linewidth measurements from phase images

Yiping Xu

doi:10.1117/12.174137

1 May 1994 Effects of dissimilar materials on submicron linewidth measurements from phase images

Yiping Xu

Proceedings Volume 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII; (1994) https://doi.org/10.1117/12.174137
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

We investigated the effect of dissimilar materials on submicron linewidth measurements that are made from phase images. When the relative reflectivity is low, errors are introduced into linewidth measurements made directly from phase images. Two calibration algorithms were developed based on the theoretical modeling of a partially coherent optical system. There was good agreement between the experimental results and the theoretical predictions.

Citation Download Citation

Yiping Xu "Effects of dissimilar materials on submicron linewidth measurements from phase images", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174137

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