1:1 catadioptric deep-UV optics with a full-circle available field

Yudong Zhang

doi:10.1117/12.175481

17 May 1994 1:1 catadioptric deep-UV optics with a full-circle available field

Yudong Zhang

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175481
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Several kinds of 1:1 catadioptric optical systems with a circle field and an obscuration aperture are described in this paper. Their available working field is a full circle which is at least twice as large as that of the previous 1:1 catadioptric optical systems.

Citation Download Citation

Yudong Zhang "1:1 catadioptric deep-UV optics with a full-circle available field", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175481

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