Attenuating phase-shift mask by thermal oxidation of chrome

David S. O'Grady; Phil B. Wilber

doi:10.1117/12.175413

17 May 1994 Attenuating phase-shift mask by thermal oxidation of chrome

David S. O'Grady, Phil B. Wilber

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175413
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A novel approach to fabricating an embedded attenuating DUV phase-shift mask by thermally oxidizing chrome is examined. Sputtered films of various chrome oxide composition have been proposed for i-line phase-shift masks, but the films to data have lacked a high enough transmission at the DUV wavelength. Thermally oxidized chrome is shown to produce a transmission usable at the DUV wavelength. The effects of oxidation time and temperature are examined, along with transmission and phase-shift as a function of chrome oxide thickness. While the thermal oxidation of chrome is not fully workable to fabricate a complete mask, it demonstrates the feasibility of using chrome-based materials in fabricating a DUV-embedded attenuating phase-shift mask.

Citation Download Citation

David S. O'Grady and Phil B. Wilber "Attenuating phase-shift mask by thermal oxidation of chrome", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175413

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