Paper
17 May 1994 Effect of shifter edge angle and lens aberration on the pattern profile in the edge-line phase-shift method
Mitsunori Nakatani, Hiroshi Matsuoka, Hirofumi Nakano, Kazuya Kamon, Kazuhiko Sato, Osamu Ishihara, Shigeru Mitsui
Author Affiliations +
Abstract
Origin of asymmetrical resist patterns, which had been observed in the edge-line phase shift lithography, has been investigated by simulations and experiments concerning the affects of shifter edge angle and stepper lens aberration. It has been found that the asymmetry of resist patterns has been caused by coma aberration of stepper projection lens and enhanced as the shifter width becomes narrower. Furthermore, the effect of shifter edge angle has been proved equivalent to the effect of narrowing the shifter width.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mitsunori Nakatani, Hiroshi Matsuoka, Hirofumi Nakano, Kazuya Kamon, Kazuhiko Sato, Osamu Ishihara, and Shigeru Mitsui "Effect of shifter edge angle and lens aberration on the pattern profile in the edge-line phase-shift method", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175410
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Cited by 1 scholarly publication.
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KEYWORDS
Phase shifts

Monochromatic aberrations

Photomasks

Lithography

Gallium arsenide

Microwave radiation

Optoelectronic devices

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