Experimental study of phase-shifting mask defect detection using phase-shifting interferometry

Yiping Xu; Donald K. Cohen; John M. O'Connor; Kuo-Ching Liu; Martin G. Cohen

doi:10.1117/12.175418

17 May 1994 Experimental study of phase-shifting mask defect detection using phase-shifting interferometry

Yiping Xu, Donald K. Cohen, John M. O'Connor, Kuo-Ching Liu, Martin G. Cohen

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175418
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A new approach is proposed that uses optical phase shifting interferometry to detect phase shifting mask (PSM) defects. The surface topography is measured directly by determining the phase information from the wavefront reflected or transmitted from the surface of the PSM. The defect size, shape, and location can then be easily determined from the measured 3D surface topography, which provides the necessary information for subsequent defect analysis, repair, or removal. A WYKO high resolution surface profiler that utilizes optical phase shifting interferometry was used to carry out extensive experimental studies on different types of programmed defects. Results show that an optical non-contact surface profiler can be very useful in PSM defect detection. A defect as small as 0.25 micrometers can be easily detected.

Citation Download Citation

Yiping Xu, Donald K. Cohen, John M. O'Connor, Kuo-Ching Liu, and Martin G. Cohen "Experimental study of phase-shifting mask defect detection using phase-shifting interferometry", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175418

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