Focusing and leveling system using position-sensitive detectors for the wafer steppers

Dohoon Kim; Won-Ick Jang; Boo-Yeon Choi; Youngjik I. Lee; Jong-Hyun Lee; Hyung Joun Yoo; S. W. Kang; Jin Hyuk Kwon

doi:10.1117/12.175492

17 May 1994 Focusing and leveling system using position-sensitive detectors for the wafer steppers

Dohoon Kim, Won-Ick Jang, Boo-Yeon Choi, Youngjik I. Lee, Jong-Hyun Lee, Hyung Joun Yoo, S. W. Kang, Jin Hyuk Kwon

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175492
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

An optical focus and leveling system for ETRI KrF excimer laser stepper is developed using position sensitive detectors (PSD) and optical magnification method. This type of detection method showed focusing and leveling accuracies of about +/- 0.1 micrometers and +/- 1.0 arcsec (+/- 0.5 X 10^-5 rad) respectively. Also, we confirmed experimentally the autofocus system has +/- 0.15 micrometers signal stability within the controlled temperature range of +/- 0.1 degree(s)C. In this paper, we report the design concepts of the focusing and leveling system and the characteristics of the system parameter applied to ETRI KrF excimer laser stepper.

Citation Download Citation

Dohoon Kim, Won-Ick Jang, Boo-Yeon Choi, Youngjik I. Lee, Jong-Hyun Lee, Hyung Joun Yoo, S. W. Kang, and Jin Hyuk Kwon "Focusing and leveling system using position-sensitive detectors for the wafer steppers", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175492

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