Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation

Alfred K. K. Wong; Andrew R. Neureuther

doi:10.1117/12.175446

17 May 1994 Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175446
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

The rigorous electromagnetic simulation program TEMPEST has been extended for analysis of three-dimensional problems, and is applied to study transmission through small contact holes and printability of 360 degree(s) phase quartz bump defects. REsults generated from the rigorous electromagnetic simulator TEMPEST can be fed into the simulator SPLAT for partial coherent imaging with arbitrary lens aberrations. Application of three-dimensional TEMPEST in small contact hole studies shows that transmission loss is about three times as much as the loss in space openings in 1X projection printing, and polarization effects can be more important than the orientation of a rectangular mask. The thin mask and scalar approximations are unacceptable as they predict no polarization effects and peak intensities that can be 2X larger than that predicted from TEMPEST. Also, 360 degree(s) phase quartz bump defects in chromeless phase-shifting masks do not produce intensity drop severe enough to cause undesired printing.

Citation Download Citation

Alfred K. K. Wong and Andrew R. Neureuther "Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175446

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