Quantitative stepper metrology using the focus monitor test mask

Timothy A. Brunner; Alexander Lee Martin; Ronald M. Martino; Christopher P. Ausschnitt; Thomas H. Newman; Michael S. Hibbs

doi:10.1117/12.175449

17 May 1994 Quantitative stepper metrology using the focus monitor test mask

Timothy A. Brunner, Alexander Lee Martin, Ronald M. Martino, Christopher P. Ausschnitt, Thomas H. Newman, Michael S. Hibbs

Author Affiliations +

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175449
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A new lithographic test pattern, the focus monitor, is introduced. Through the use of phase shift techniques, focus errors translate into easily measurable overlay shifts in the printed pattern. Each individual focus monitor pattern can be directly read for the sign and magnitude of the focus error. This paper presents a detailed verification of the validity of this approach, along with several preliminary applications.

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Timothy A. Brunner, Alexander Lee Martin, Ronald M. Martino, Christopher P. Ausschnitt, Thomas H. Newman, and Michael S. Hibbs "Quantitative stepper metrology using the focus monitor test mask", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175449

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