Scattered light in photolithographic lenses

Joseph P. Kirk

doi:10.1117/12.175451

17 May 1994 Scattered light in photolithographic lenses

Joseph P. Kirk

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175451
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Scattered light, flare, is present in the images formed by all photolithography lenses and it reduces lithographic process tolerances. It varies from lens to lens and with time, but is easily measured by observation of images of opaque objects formed in positive photoresist. The scattered light halo of a lens is modeled and the model used to estimate the flare for any reticle used with that lens.

Citation Download Citation

Joseph P. Kirk "Scattered light in photolithographic lenses", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175451

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