Paper
23 June 1995 Design of the narrow band nonpolarizing antireflection coating illustrated with admittance diagrams
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Proceedings Volume 2208, Refractometry; (1995) https://doi.org/10.1117/12.213203
Event: Refractometry: International Conference, 1994, Warsaw, Poland
Abstract
Costich's concept of intersection admittance for s- and p-polarization components of reflectivity of symmetrical three-layer subsystems together with depolarization of the incident medium and the substrate is used to design nonpolarizing narrow band anti-reflection coating. First, incident medium with one layer sub-coating and the substrate with three-layer sub- coating which forms a nonpolarizing structure of defined depolarized effective admittances are discussed. Next, the group of three layers was found which operates as depolarized system with effective admittance which match effective admittances of incident medium and the substrates are discussed. Superimposing of all these subsystems arrive at the design of the seven layer narrow band nonpolarizing anti-reflection coating. Ohmer's algorithm in generalized form by Knittl and Houserkova was used for finding the structure of the matching subsystem. Results of calculations are shown in graphical forms using conjugate s- and p- admittance diagrams.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Grzegorz Jerzy Kopec "Design of the narrow band nonpolarizing antireflection coating illustrated with admittance diagrams", Proc. SPIE 2208, Refractometry, (23 June 1995); https://doi.org/10.1117/12.213203
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