Measurement of refraction and absorption indices of thin polymer film on the transparent semiconductor substrate via FTIR spectrometry

Polina G. Buyanovskaya

doi:10.1117/12.213187

23 June 1995 Measurement of refraction and absorption indices of thin polymer film on the transparent semiconductor substrate via FTIR spectrometry

Polina G. Buyanovskaya

Author Affiliations +

Proceedings Volume 2208, Refractometry; (1995) https://doi.org/10.1117/12.213187
Event: Refractometry: International Conference, 1994, Warsaw, Poland

Abstract

The inverse problem of determination of the optical parameters of thin polymer film on the monocrystalline silicon wafer when experimental transmission spectra are used, is solved for the special case of low absorption. Solution is carried out with allowance for the light interference in the film and multiple reflections of light in the wafer. Our results show that dependence of absorption bands intensity on the film thickness is nonmonotonous, i.e. interference has an influence on the optical density of absorption bands in registered spectrum.

Citation Download Citation

Polina G. Buyanovskaya "Measurement of refraction and absorption indices of thin polymer film on the transparent semiconductor substrate via FTIR spectrometry", Proc. SPIE 2208, Refractometry, (23 June 1995); https://doi.org/10.1117/12.213187

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