New technologies of integrated optics elements fabrication: monolith integrated-optical device

Alexander M. Kamuz; Pavel F. Oleksenko; Y. U. Ovsyannikov; S. D. Kiyashko; Oksana N. Stril'chuk

doi:10.1117/12.180972

28 July 1994 New technologies of integrated optics elements fabrication: monolith integrated-optical device

Alexander M. Kamuz, Pavel F. Oleksenko, Y. U. Ovsyannikov, S. D. Kiyashko, Oksana N. Stril'chuk

Proceedings Volume 2213, Nanofabrication Technologies and Device Integration; (1994) https://doi.org/10.1117/12.180972
Event: Integrated Optoelectronics '94, 1994, Lindau, Germany

Abstract

The new technology for making the elements and devices of semiconductor integrated optics is presented. We report about creation in the planar diffusion CdSSe-waveguides such integrated optical elements as the channel waveguides, diffractive gratings for input or output of the emission, local waveguide photoresistors and monolith integrated optical device. This technology is based on the phenomenon of the light induced irreversible change (decreasing) of the subsurface layer refractive index of the single crystal that is immersed in high polar liquid at the room temperature under band-to-band absorbed illumination. At the first time this phenomenon was detected by us in CdS-single crystals and called low temperature photohydromodification.

Citation Download Citation

Alexander M. Kamuz, Pavel F. Oleksenko, Y. U. Ovsyannikov, S. D. Kiyashko, and Oksana N. Stril'chuk "New technologies of integrated optics elements fabrication: monolith integrated-optical device", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180972

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