Sub-micrometer patterning of strip-antiresonant-reflecting-optical waveguide structures by e-beam direct writing

J. Gehler; Andreas H. Braeuer; Wolfgang Karthe; Norbert Haase

doi:10.1117/12.180958

28 July 1994 Sub-micrometer patterning of strip-antiresonant-reflecting-optical waveguide structures by e-beam direct writing

J. Gehler, Andreas H. Braeuer, Wolfgang Karthe, Norbert Haase

Author Affiliations +

Proceedings Volume 2213, Nanofabrication Technologies and Device Integration; (1994) https://doi.org/10.1117/12.180958
Event: Integrated Optoelectronics '94, 1994, Lindau, Germany

Abstract

Antiresonant reflecting optical waveguide (ARROW) structures in strip configuration have been designed and fabricated on a SiON- SiO₂-Si-wafer. The ARROW structures have been calculated by combining the effective index method with the transfer matrix approach and their field distribution by FEM. The width of the reflectors corresponds to the (lambda) /4 layers for the lateral component of the wavevector and, therefore, strips of 0.2 to 0.6 micrometers width are patterned by e-beam direct writing and etched into SiON by RIE. As an application a directional coupler consisting of two parallel strip-ARROWs is realized on the same substrate. The coupling length is a periodic function of the waveguide separation because of the leaky wave mechanism in waveguiding. Remote coupling up to 93 micrometers is demonstrated experimentally.

Citation Download Citation

J. Gehler, Andreas H. Braeuer, Wolfgang Karthe, and Norbert Haase "Sub-micrometer patterning of strip-antiresonant-reflecting-optical waveguide structures by e-beam direct writing", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180958

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