Transfer of submicron period gratings by conventional chromium mask photolithography

Henry Vuilliomenet; Lucien G. Falco; Olivier M. Parriaux; Michel Neviere

doi:10.1117/12.180959

28 July 1994 Transfer of submicron period gratings by conventional chromium mask photolithography

Henry Vuilliomenet, Lucien G. Falco, Olivier M. Parriaux, Michel Neviere

Proceedings Volume 2213, Nanofabrication Technologies and Device Integration; (1994) https://doi.org/10.1117/12.180959
Event: Integrated Optoelectronics '94, 1994, Lindau, Germany

Abstract

Conventional chromium mask transfer can be used for the photolithographic transfer of high spatial frequency gratings at nonnormal incidence. A systematic study brings the tolerance on the transfer parameters such as proximity, angle of incidence, and line/space ratio.

Citation Download Citation

Henry Vuilliomenet, Lucien G. Falco, Olivier M. Parriaux, and Michel Neviere "Transfer of submicron period gratings by conventional chromium mask photolithography", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180959

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