Influence of preparation conditions on the laser damage threshold of oxide thin films at 248 nm measured by photoacoustic mirage detection

Michael Reichling; J. Siegel; Eckart Matthias; Dieter Schaefer; Peter Thomsen-Schmidt

doi:10.1117/12.192096

4 November 1994 Influence of preparation conditions on the laser damage threshold of oxide thin films at 248 nm measured by photoacoustic mirage detection

Michael Reichling, J. Siegel, Eckart Matthias, Dieter Schaefer, Peter Thomsen-Schmidt

Author Affiliations +

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192096
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

The ablation damage thresholds for electron beam evaporated HfO₂/SiO₂ single-, double-, and triple-layer systems of (lambda) /4 optical thickness ((lambda) equals 248 nm) are measured by the pulsed photoacoustic mirage technique. It is shown that the apparent threshold depends on the specific system design and results are interpreted in terms of the electric field distribution in the respective configuration. For one system it is demonstrated that the threshold for the onset of damage measured by the mirage technique can be enhanced by a factor of two when the layers are deposited by laser assisted evaporation technique.

Citation Download Citation

Michael Reichling, J. Siegel, Eckart Matthias, Dieter Schaefer, and Peter Thomsen-Schmidt "Influence of preparation conditions on the laser damage threshold of oxide thin films at 248 nm measured by photoacoustic mirage detection", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192096

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