New algorithm for single wavelength ellipsometry of samples consisting of two absorbing layers

Salvador Bosch; Santiago Vallmitjana; Francisco Monzonis

doi:10.1117/12.192055

4 November 1994 New algorithm for single-wavelength ellipsometry of samples consisting of two absorbing layers

Salvador Bosch, Santiago Vallmitjana, Francisco Monzonis

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192055
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

The generalization of a recent numerical inversion procedure for the analysis of ellipsometric data of double layer samples is described. Within this generalization, data reduction for any double absorbing layer configuration is easily accomplished. Starting from a ((Delta) , (Psi) ) measurement of a single incidence angle and single wavelength ellipsometer, our method will allow finding any two configuration parameters, provided one of them is a thickness. This reduces the constraints of previous methods, leading also to a simple 1D root- finding numerical scheme. Useful graphical procedures for the analysis of double-layer ellipsometric results are easily devised.

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Salvador Bosch, Santiago Vallmitjana, and Francisco Monzonis "New algorithm for single-wavelength ellipsometry of samples consisting of two absorbing layers", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192055

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KEYWORDS

Refractive index

Ellipsometry

Silicon

Statistical analysis

Polarization

Reflection

Coating

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