New mask optimization methodology using exposure-defocus and mask fabrication latitude

Keisuke Tsudaka; Minoru Sugawara; Hiroichi Kawahira; Akihiro Ogura; Satoru Nozawa

doi:10.1117/12.191933

3 November 1994 New mask optimization methodology using exposure-defocus and mask fabrication latitude

Keisuke Tsudaka, Minoru Sugawara, Hiroichi Kawahira, Akihiro Ogura, Satoru Nozawa

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191933
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

EDM (Exposure-Defocus and Mask fabrication latitude) methodology has been established in order to evaluate the practical and reliable process latitudes. A parameter of mask linewidth is newly introduced in the EDM methodology as well as the conventional parameters, exposure dose and defocus, because the mask linewidth fluctuation is an important contributor to the image degradation on wafer especially for the patterns close to the resolution limit, where the wafer linewidth is nonlinear to the mask linewidth. In this paper, the algorithm of this methodology is discussed in detail by a general formula, and its feasibility is then verified by simulating 0.4 micrometers isolated contact hole imaging in the cases of binary mask with i-line, i- line/FLEX method or KrF exposure, and attenuated phase shifting mask with i-line exposure. For each application, the practical process latitude can be precisely defined in the 3D space of the exposure dose, defocus and mask linewidth latitude.

Citation Download Citation

Keisuke Tsudaka, Minoru Sugawara, Hiroichi Kawahira, Akihiro Ogura, and Satoru Nozawa "New mask optimization methodology using exposure-defocus and mask fabrication latitude", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191933

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