Possibility of real-time proximity effect correction for reticle writing

Takayuki Abe

doi:10.1117/12.191930

3 November 1994 Possibility of real-time proximity effect correction for reticle writing

Takayuki Abe

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191930
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

Proximity effect correction for reticle making is discussed. The algorithm for calculating optimum dose is based on the dose formula method and the representative figure method. Its main feature is that dose evaluation points are fixed at individual small regions whose size is sufficiently small compared with the back scattering range. The time for preparing the representative figures for a 1G DRAM and an 8 M gate array was evaluated as 10 and 1.5 minutes, respectively, when a 4 CPU system with a calculation speed of 100 MIPS was used. On the other hand, the correction time for a 10 X 10 cm reticle area was evaluated as 2 - 3 hours by using a 100 MIPS 1 CPU system. It is considered that real-time proximity effect correction will be possible when a parallel processing system with multiplicity of 4 - 7 is used.

Citation Download Citation

Takayuki Abe "Possibility of real-time proximity effect correction for reticle writing", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191930

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