Electrochromism in oxyfluoride thin films

Andris Azens; A. Gutarra; B. A. Stjerna; Claes-Goeran Granqvist; J. Gabrusenoks; Andrejs R. Lusis

doi:10.1117/12.185386

9 September 1994 Electrochromism in oxyfluoride thin films

Andris Azens, A. Gutarra, B. A. Stjerna, Claes-Goeran Granqvist, J. Gabrusenoks, Andrejs R. Lusis

Proceedings Volume 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII; (1994) https://doi.org/10.1117/12.185386
Event: Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, 1994, Freiburg, Germany

Abstract

Oxyfluoride films based on W and Ti were prepared by reactive sputtering in plasmas containing O₂ + CF₄. The deposition rate was large, particularly when chemical sputtering was promoted by heating the target. The films could show large charge insertion/extraction, high coloration efficiency, and good cycling durability.

Citation Download Citation

Andris Azens, A. Gutarra, B. A. Stjerna, Claes-Goeran Granqvist, J. Gabrusenoks, and Andrejs R. Lusis "Electrochromism in oxyfluoride thin films", Proc. SPIE 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, (9 September 1994); https://doi.org/10.1117/12.185386

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