Scatter performance of a plasma-cleaned germanium wafer flown on the Long-Duration Exposure Facility

Richard Fedors

doi:10.1117/12.190150

19 October 1994 Scatter performance of a plasma-cleaned germanium wafer flown on the Long-Duration Exposure Facility

Richard Fedors

Proceedings Volume 2261, Optical System Contamination: Effects, Measurements, and Control IV; (1994) https://doi.org/10.1117/12.190150
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

A germanium wafer from the Long Duration Exposure Facility Interplanetary Dust Experiment underwent plasma cleaning to evaluate contamination removal effectiveness for molecular layers that had accumulated over the course of the mission. Angle resolved scattering at visible wavelength was utilized to measure the change in optical performance between the as-received and cleaned portions of the test sample. Results showed a significant improvement in the sample's optical quality with reactive ion cleaning, based on laboratory measurements of bi-directional reflectance distribution. Test procedures, instrumentation, and experimental data (including computed total integrated scatter) are described. Besides detecting and removing environmental contamination from sensitive optical surfaces, these techniques could be applied to semiconductor manufacturing to increase product yield, lower production costs, and improve component reliability.

Citation Download Citation

Richard Fedors "Scatter performance of a plasma-cleaned germanium wafer flown on the Long-Duration Exposure Facility", Proc. SPIE 2261, Optical System Contamination: Effects, Measurements, and Control IV, (19 October 1994); https://doi.org/10.1117/12.190150

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