Vapor-gel deposition method for optical coatings

Kueir Weei Chour; Ren Xu

doi:10.1117/12.188979

13 October 1994 Vapor-gel deposition method for optical coatings

Kueir Weei Chour, Ren Xu

Proceedings Volume 2288, Sol-Gel Optics III; (1994) https://doi.org/10.1117/12.188979
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

A vapor-gel process is implemented to achieve deposition of stoichiometric LiTaO₃ on a variety of substrates using LiTa(OButⁿ)6 precursor. Such process involves the vapor- phase hydrolysis of volatile double alkoxides, and polycondensation of the partially hydrolyzed double alkoxide on heated substrates. It was demonstrated that an intrinsically stoichiometric vapor-deposition can be realized using heterometalorganic complexes and the hydrolysis- polycondensation reaction scheme. We report typical deposition and annealing conditions used in this study, x-ray diffraction, SEM and composition analyses of the films grown on fused silica, Pt, sapphire (1010) and LiNbO₃ (0006). Composition analysis achieved by measurement of lattice parameters confirmed that the vapor-gel method using double alkoxide can produce high quality, stoichiometric LiTaO₃. Mass spectrometric study of the precursor compound LiTa(OButⁿ)6 suggests that the volatile species responsible for the stoichiometric vapor deposition is Li₂Ta₂(OButⁿ)12. Rocking curve measurement indicated excellent epitaxial growth of LiTaO₃ on LiNbO₃ (0006).

Citation Download Citation

Kueir Weei Chour and Ren Xu "Vapor-gel deposition method for optical coatings", Proc. SPIE 2288, Sol-Gel Optics III, (13 October 1994); https://doi.org/10.1117/12.188979

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