Advanced pelliclization techniques

Carl Johnson; Eric T. Chase

doi:10.1117/12.195816

7 December 1994 Advanced pelliclization techniques

Carl Johnson, Eric T. Chase

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195816
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

In 1988 the leading cause of mask returns was the presence of soft defects with a return rate of about 3%. By the end of the first quarter of 1992 the rate of return for soft defects was less than .3%. This dramatic increase in mask quality with respect to contamination coincided with widespread implementation of inspection equipment and more stringent manufacturing methods. There is a strong indication that by using inspection equipment to find contamination problems, the mask builders were able to adjust their processes to achieve maximum yield and a minimum rate of mask returns. The rate of return has remained at a steady level since the beginning of 1992 which suggests that to improve further, and to keep pace with more stringent defect specifications, more advanced inspection techniques and pelliclization processes are needed. This presentation outlines the implementation of an advanced automated pelliclizing system with integrated inspection of both the reticle and the pellicles. Improved inspection techniques to meet the demands of complex photomasks are discussed. Emphasis is placed on the ability to inspect the mask and pellicles at critical points of the process so that process control can be established.

Citation Download Citation

Carl Johnson and Eric T. Chase "Advanced pelliclization techniques", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195816

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KEYWORDS

Reticles

Inspection

Pellicles

Photomasks

Particles

Photomask technology

Contamination

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