Paper
7 December 1994 Mask making: today's enabling technology
Stephen E. Cooper
Author Affiliations +
Abstract
Not since the late 1970s has the potential existed for maskmakers to provide such significant value to the device manufacturer. This paper addresses this emerging opportunity and the challenges it represents. In addition to opportunities, we look at possible setbacks as the industry returns from what has been accurately described as the seven-year vacation.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen E. Cooper "Mask making: today's enabling technology", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195804
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Manufacturing

Semiconductors

Reticles

Photomask technology

Lithography

Optical proximity correction

Back to Top