Translator Disclaimer
Paper
7 December 1994 Mask making: today's enabling technology
Author Affiliations +
Abstract
Not since the late 1970s has the potential existed for maskmakers to provide such significant value to the device manufacturer. This paper addresses this emerging opportunity and the challenges it represents. In addition to opportunities, we look at possible setbacks as the industry returns from what has been accurately described as the seven-year vacation.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen E. Cooper "Mask making: today's enabling technology", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195804
PROCEEDINGS
5 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Impact of OPC aggressiveness on mask manufacturability
Proceedings of SPIE (August 28 2003)
Sizing the next generation of optical photomasks
Proceedings of SPIE (July 03 1995)
SEMATECH J111 project: OPC validation
Proceedings of SPIE (June 29 1998)
Cost of ownership for x-ray proximity lithography
Proceedings of SPIE (May 13 1994)

Back to Top