Paper
14 September 1994 Semi-empirical MOCVD modeling using neural networks
Ziba Nami, Ahmet Erbil, Gary Stephen May
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Abstract
Metal-organic chemical vapor deposition (MOCVD) is an important fabrication process used to grow thin epitaxial films on solid substrates. The development of an accurate and efficient model for this technique is therefore quite desirable from a manufacturing standpoint. In this paper, semi-empirical modeling of TiO2 film growth by MOCVD using a hybrid neural network is introduced. This hybrid model combines the best aspects of physical models and purely empirical methods. The model was constructed by characterization of the deposition rate of TiO2 films under various operating conditions. A modified back-propagation neural network was trained on the experimental data to determine the value of three critical unknown parameters of the physical model. Using this approach, comparison with measured data showed that the hybrid model is capable of predicting the TiO2 deposition rate with a high degree of accuracy.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ziba Nami, Ahmet Erbil, and Gary Stephen May "Semi-empirical MOCVD modeling using neural networks", Proc. SPIE 2334, Microelectronics Manufacturability, Yield, and Reliability, (14 September 1994); https://doi.org/10.1117/12.186761
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Cited by 1 scholarly publication.
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KEYWORDS
Process modeling

Neural networks

Metalorganic chemical vapor deposition

Data modeling

Argon

Diffusion

Neurons

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