High-density optical disk mastering using UV light source

Shinichi Katsuda; Kenichi Ishizuka; Naoki Ohmura; Katsu Yamada

doi:10.1117/12.190188

12 October 1994 High-density optical disk mastering using UV light source

Shinichi Katsuda, Kenichi Ishizuka, Naoki Ohmura, Katsu Yamada

Proceedings Volume 2338, 1994 Topical Meeting on Optical Data Storage; (1994) https://doi.org/10.1117/12.190188
Event: Optical Data Storage '94, 1994, Dana Point, CA, United States

Abstract

For high density optical disk mastering processes, it is important to appropriately select the light source and optical layout as well as to optimize photoresist and exposure method. A g-line type photoresist is preferred for use in the mastering processes, compared with i-line type photoresist. By using the UV light source, the pit width is narrowed down to 0.25 micrometers , which is easily fabricated. Under preferred fabrication exposure power for cross talk and modulation amplitude, excellent jitter values, 8/8 ns, 10.8 ns and 16.9 ns were achieved for quadrupled, quintupled and 6-times density CD-ROMs.

Citation Download Citation

Shinichi Katsuda, Kenichi Ishizuka, Naoki Ohmura, and Katsu Yamada "High-density optical disk mastering using UV light source", Proc. SPIE 2338, 1994 Topical Meeting on Optical Data Storage, (12 October 1994); https://doi.org/10.1117/12.190188

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