Monitoring of YBCO thin film constituent in magnetron sputtering on line

Zhuangjin Zhang; Longjian Liu; Jie Shen; Zhongyi Hua

doi:10.1117/12.190818

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26 October 1994 Monitoring of YBCO thin film constituent in magnetron sputtering on line

Zhuangjin Zhang, Longjian Liu, Jie Shen, Zhongyi Hua

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Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190818
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China

Abstract

The constituents of the YBCO thin films deposited by DC magnetron sputtering will deviate from that of the target. The origin of that deviation was discussed and a method to monitor the film constituent was raised by measuring the intensity of each individual persistent line of yttrium, barium and copper from the discharge region.

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Zhuangjin Zhang, Longjian Liu, Jie Shen, and Zhongyi Hua "Monitoring of YBCO thin film constituent in magnetron sputtering on line", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); https://doi.org/10.1117/12.190818

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