Oxygen diffusion through Yb2O3/YBa2Cu307-delta bilayers

S. C. Tidrow; Richard T. Lareau; W. D. Wilber; A. Tauber; D. W. Eckart; R. L. Pfeiffer; R. D. Finnegan

doi:10.1117/12.190816

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26 October 1994 Oxygen diffusion through Yb2O₃/YBa₂Cu₃0_7-δ bilayers

S. C. Tidrow, Richard T. Lareau, W. D. Wilber, A. Tauber, D. W. Eckart, R. L. Pfeiffer, R. D. Finnegan

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Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190816
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China

Abstract

We have studied the rate of oxygen diffusion through ytterbium oxide (Yb₂O$3), a buffer and dielectric layer used in high critical temperature superconducting (HTSC) structures. An epitaxial bilayer film of Yb₂O₃ on YBa₂Cu$3)O_7-(delta ) (YBCO) was deposited onto an (001) oriented single crystal MgO substrate using the pulsed laser deposition technique. The rate of oxygen diffusion through the bilayer was investigated from 365 to 655 degree(s)C by post deposition annealing individual section of the bilayer in 0.5 atm of ¹⁸O enriched molecular oxygen gas. Secondary ion mass spectroscopy was used to depth profile ¹⁸O and ¹⁶O in each sample. Oxygen diffusion coefficients for Yb₂O₃ at 365, 465, 555 and 655 degree(s)C were determined to be roughly (6, 16, 360, and 200) X 10^-1, respectively. For temperatures greater than about 500 degree(s)C, these diffusion rates can limit oxygen intake into underlying YBCO films; therefore, HTSC multilayer devices that utilize Yb₂O₃ as a dielectric layer may require longer annealing cycles in order to fully oxygenate each underlying HTSC layer.

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S. C. Tidrow, Richard T. Lareau, W. D. Wilber, A. Tauber, D. W. Eckart, R. L. Pfeiffer, and R. D. Finnegan "Oxygen diffusion through Yb2O₃/YBa₂Cu₃0_7-δ bilayers", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); https://doi.org/10.1117/12.190816

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