Translator Disclaimer
Paper
12 May 1995 How manufacturing errors in binary optics arrays affect far-field patterns
Author Affiliations +
Abstract
The use of scanning probe microscopies -- such as scanning tunneling microscopy (STM) and ballistic electron emission microscopy (BEEM) to study carrier transport through semiconductor heterostructures -- is reviewed. The ability of BEEM to probe buried structures below the surface can be exploited to study heterostructure band-offsets and resonant tunneling through quantum structures. It is shown that BEEM can serve as a powerful probe of the spectroscopy of such structures. The implications of such studies for research on quantum dots and the characterization of new optoelectronic materials are discussed.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul D. Hillman "How manufacturing errors in binary optics arrays affect far-field patterns", Proc. SPIE 2383, Micro-Optics/Micromechanics and Laser Scanning and Shaping, (12 May 1995); https://doi.org/10.1117/12.209031
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
Back to Top