Nonlinear optical properties of metal-nitride thin films

Paul M. Lundquist; Weiping Lin; John B. Ketterson; George K. Wong; Long D. Zhu; Peter E. Norris

doi:10.1117/12.206880

24 April 1995 Nonlinear optical properties of metal-nitride thin films

Paul M. Lundquist, Weiping Lin, John B. Ketterson, George K. Wong, Long D. Zhu, Peter E. Norris

Proceedings Volume 2397, Optoelectronic Integrated Circuit Materials, Physics, and Devices; (1995) https://doi.org/10.1117/12.206880
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

Robust second-order optical nonlinearities comparable to those in common nonlinear optical materials have been reported in metal nitrides. In this paper we present experimental studies of gallium nitride and aluminum nitride thin films, including fabrication and optical characterization. The ease of thin film deposition techniques employed for these materials indicate that they may have potential for cost effective development of nonlinear optical waveguide devices.

Citation Download Citation

Paul M. Lundquist, Weiping Lin, John B. Ketterson, George K. Wong, Long D. Zhu, and Peter E. Norris "Nonlinear optical properties of metal-nitride thin films", Proc. SPIE 2397, Optoelectronic Integrated Circuit Materials, Physics, and Devices, (24 April 1995); https://doi.org/10.1117/12.206880

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