New optical waveguide structure: a trench-channel-type high-density waveguide in Si

Tohru Nakamura; Takeshi Kato; Tomonori Tanoue; Fumio Murai; Mitsuo Takeda

doi:10.1117/12.206298

5 April 1995 New optical waveguide structure: a trench-channel-type high-density waveguide in Si

Tohru Nakamura, Takeshi Kato, Tomonori Tanoue, Fumio Murai, Mitsuo Takeda

Proceedings Volume 2400, Optoelectronic Interconnects III; (1995) https://doi.org/10.1117/12.206298
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

A new optical waveguide suitable for high-packing-density OEICs is proposed. The waveguides are embedded in trenches, with large depth/width ratios, in a silicon substrate. The spacing between the waveguides and their pitch were less than 2 micrometers and 4 micrometers , respectively. This structure enables ultra high density optical interconnections in a silicon substrate.

Citation Download Citation

Tohru Nakamura, Takeshi Kato, Tomonori Tanoue, Fumio Murai, and Mitsuo Takeda "New optical waveguide structure: a trench-channel-type high-density waveguide in Si", Proc. SPIE 2400, Optoelectronic Interconnects III, (5 April 1995); https://doi.org/10.1117/12.206298

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