Computer-generated holographic diffractive structures fabricated by direct excimer laser microetching

Leonidas Boutsikaris; Sakellaris Mailis; Nicholas Madamopoulos; S. Pissadakis; A. Petrakis; Nikos A. Vainos; P. Dainty; P. J. M. Parmiter; Trevor J. Hall

doi:10.1117/12.206284

10 April 1995 Computer-generated holographic diffractive structures fabricated by direct excimer laser microetching

Leonidas Boutsikaris, Sakellaris Mailis, Nicholas Madamopoulos, S. Pissadakis, A. Petrakis, Nikos A. Vainos, P. Dainty, P. J. M. Parmiter, Trevor J. Hall

Author Affiliations +

Proceedings Volume 2403, Laser-Induced Thin Film Processing; (1995) https://doi.org/10.1117/12.206284
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

Excimer laser microetching is applied on various substrate materials, including metals, metal alloys, semiconductors, and polymers, of arbitrary geometrical shape for fabricating surface-relief optical microstructures with very fine features (micron width/micron depth, or less). Particularly good results have been obtained with hardened photoresist, lithium niobate crystals, and stainless steel. The method is based on selective laser ablative etching achieved by projecting a mask, on a reduction basis, onto the substrate material. In addition to simple rectangular metal masks, computer generated holographic mask patterns were used. These hologram masters were optically plotted on photoresist, and then wet etched to produce chrome-on-quartz masks. A consecutive step-and-repeat method was used to replicate the mask on the substrate. Several types of surface relief holograms were directly etched on various materials. One class of holograms upon reconstruction produces an 8 X 8 square optical interconnect array. Another type reproduces a specific design pattern consisting of characters and numbers. Full automation of the microetching process in conjunction with a raster scanning method allows the fabrication of arbitrary pixellated multilevel micro-patterns. The direct nature of the etching technique appears to be very attractive since it eliminates the need for substrate material pre- or post-processing and can be applied to almost any solid material.

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Leonidas Boutsikaris, Sakellaris Mailis, Nicholas Madamopoulos, S. Pissadakis, A. Petrakis, Nikos A. Vainos, P. Dainty, P. J. M. Parmiter, and Trevor J. Hall "Computer-generated holographic diffractive structures fabricated by direct excimer laser microetching", Proc. SPIE 2403, Laser-Induced Thin Film Processing, (10 April 1995); https://doi.org/10.1117/12.206284

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KEYWORDS

Etching

Excimer lasers

Photomasks

Computer generated holography

Holograms

Photoresist materials

Holography

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