UV pretreatments for improved etching of organic antireflective coating (ARC) layer

Linda J. Insalaco; Vandana N. Krishnamurthy; John L. Sturtevant; James C. Mitchener

doi:10.1117/12.210379

9 June 1995 UV pretreatments for improved etching of organic antireflective coating (ARC) layer

Linda J. Insalaco, Vandana N. Krishnamurthy, John L. Sturtevant, James C. Mitchener

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210379
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

In this paper we present a technique utilizing intense UV exposure to alter the chemical properties of an organic antireflective material such that dry etch performance is improved. By monitoring the ARC thickness before and after UV exposure, it can be demonstrated that prolonged UV exposure coupled with a specific range of substrate temperatures can result in a dramatic reduction in ARC thickness. Similar measurements taken before and after ARC etch reveal an improvement in etch rate in ARC samples previously subjected to intense UV exposure. Changes in ARC structure and etch performance are presented as functions of UV wavelengths, substrate temperature, and exposure time.

Citation Download Citation

Linda J. Insalaco, Vandana N. Krishnamurthy, John L. Sturtevant, and James C. Mitchener "UV pretreatments for improved etching of organic antireflective coating (ARC) layer", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210379

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