Automated layout of mask assist-features for realizing 0.5 k1 ASIC lithography

Joseph G. Garofalo; Oberdan W. Otto; Raymond A. Cirelli; Robert L. Kostelak; Sheila Vaidya

doi:10.1117/12.209262

26 May 1995 Automated layout of mask assist-features for realizing 0.5 k₁ ASIC lithography

Joseph G. Garofalo, Oberdan W. Otto, Raymond A. Cirelli, Robert L. Kostelak, Sheila Vaidya

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209262
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The virtues of mask-plane assist features for improving imaging performance of generic ASIC layouts in the 0.5k₁ realm has been previously proclaimed. In this report we provide experimental verification and introduce a methodology to automatically deploy these features on ASIC layouts.

Citation Download Citation

Joseph G. Garofalo, Oberdan W. Otto, Raymond A. Cirelli, Robert L. Kostelak, and Sheila Vaidya "Automated layout of mask assist-features for realizing 0.5 k₁ ASIC lithography", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209262

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