Step and scan: the maturing technology

Harry Sewell

doi:10.1117/12.209256

26 May 1995 Step and scan: the maturing technology

Harry Sewell

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209256
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

This paper reviews the status of step-and-scan technology. It reviews the main features of the technology and highlights its advantages over the conventional step-and-repeat technology. Data is presented to show the superior field distortion, linewidth control, and overlay performance offered by step-and-scan. The future direction of the technology is discussed in the context of the Semiconductor Industry Association (SIA) roadmap. It is indicated that the step-and-scan technique will allow optical lithography to extend below 180 nm resolution.

Citation Download Citation

Harry Sewell "Step and scan: the maturing technology", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209256

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