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26 May 1995 Silicon micromachining and its applications
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Abstract
Recent development of silicon micromachining technology has made possible the fabrication of many micromechanical devices. Applications of these micromechanical devices are many, but their use for smart structures and materials has just begun. Here, an updated report on the development of a drag-reducing smart skin is given. In order to facilitate the fabrication of the smart skin, we have first developed a new sacrificial-layer etching model for etching phosphosilicate-glass using hydrofluoric acid. This model then leads to the development of two key devices for the skin, including a shear-stress sensor and a magnetic microactuator.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yu-Chong Tai and Chih-Ming Ho "Silicon micromachining and its applications", Proc. SPIE 2448, Smart Structures and Materials 1995: Smart Electronics, (26 May 1995); https://doi.org/10.1117/12.210457
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