Deposition of metallic thin layers by photolytic versus thermal-laser-induced processes

Rodica Alexandrescu; A. Andrei; Raluca Cireasa; Ion G. Morjan; Ioan Ursu; Letitia Voicu

doi:10.1117/12.203522

8 March 1995 Deposition of metallic thin layers by photolytic versus thermal-laser-induced processes

Rodica Alexandrescu, A. Andrei, Raluca Cireasa, Ion G. Morjan, Ioan Ursu, Letitia Voicu

Proceedings Volume 2461, ROMOPTO '94: Fourth Conference in Optics; (1995) https://doi.org/10.1117/12.203522
Event: ROMOPTO '94: 4th Conference on Optics, 1994, Bucharest, Romania

Abstract

Laser-assisted processes for metal-based thin films deposition are currently using vapor-phase precursors. Either photolytic or thermal, the mechanisms developed during laser-induced interaction between adsorbed precursor and substrate are imposing different trends to the composition and morphology of the growing metallic layer. Various aspects of the dynamics of film growth are discussed, in connection with the deposition of titanium from titanium tetrachloride.

Citation Download Citation

Rodica Alexandrescu, A. Andrei, Raluca Cireasa, Ion G. Morjan, Ioan Ursu, and Letitia Voicu "Deposition of metallic thin layers by photolytic versus thermal-laser-induced processes", Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); https://doi.org/10.1117/12.203522

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