Performance improvement in electron-beam reticle writing system

Hirohito Anze; Satoshi Yamasaki; Shuichi Tamamushi; Yoji Ogawa; Eiji Murakami; Ryoichi Hirano; Kazuto Matsuki

doi:10.1117/12.212764

3 July 1995 Performance improvement in electron-beam reticle writing system

Hirohito Anze, Satoshi Yamasaki, Shuichi Tamamushi, Yoji Ogawa, Eiji Murakami, Ryoichi Hirano, Kazuto Matsuki

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212764
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

Several experiments in order to improve throughput and accuracy have been carried out on electron beam reticle writing system which adopts variably shaped beam, vector scanning, and continuously moving stage. Stage speed optimization process by the stripe is introduced to reduce the writing time loss which arises from constant stage speed through writing a reticle. As a result, writing time decreases to 2/3 on average and the throughput of 2 reticles of 64 Mbit DRAM class per hour can be realized. Substrate clamping configuration for writing and measuring machine affects the substrate flexure and deteriorates the global positioning accuracy. The change of clamping point number form 4 to 3 for each machine improves the reproducibility of global distortion to 47% or more. The multipass writing method is effective to reduce stripe stitching error and fluctuation of the main-field position. In the case of multiplicity of 4, stripe stitching error and fluctuation of the main-field are 20 nm and 13 nm, respectively. The writing time ratio compared with single-pass writing is 1.6 even in 4-pass writing. Therefore, throughput should also be emphasized in view of accuracy improvements.

Citation Download Citation

Hirohito Anze, Satoshi Yamasaki, Shuichi Tamamushi, Yoji Ogawa, Eiji Murakami, Ryoichi Hirano, and Kazuto Matsuki "Performance improvement in electron-beam reticle writing system", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212764

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available