Quality control of embedded-type phase-shift mask

Yoshiro Yamada; Kazuaki Chiba; Eisei Karikawa; Hiromasa Unno; Yasutaka Kikuchi; Katsuhiro Kinemura; Masao Otaki

doi:10.1117/12.212785

3 July 1995 Quality control of embedded-type phase-shift mask

Yoshiro Yamada, Kazuaki Chiba, Eisei Karikawa, Hiromasa Unno, Yasutaka Kikuchi, Katsuhiro Kinemura, Masao Otaki

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212785
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

We have been developing the technology for phase shift masks since 1991 in order to supply the reticles for 64 MDRAM generation and after. We are still developing both the alternative and embedded types fori-line. The embedded type is suitable for ASIC and contact hole. Now, we are reaching an adequate supply of embedded type PSMs for practical use. Currently the embedded types is relatively popular because the burden on designing is small, the process is comparatively short, and defect repair is easier.

Citation Download Citation

Yoshiro Yamada, Kazuaki Chiba, Eisei Karikawa, Hiromasa Unno, Yasutaka Kikuchi, Katsuhiro Kinemura, and Masao Otaki "Quality control of embedded-type phase-shift mask", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212785

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available