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6 September 1995 Near-field measurements of optical channel waveguides
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Abstract
Near field microscopy has been used to investigate the guided mode intensity distribution in a variety of optical channel waveguide structures. We have studied the optical field intensity distribution in channel waveguides, directional couplers, and Y-branches above the surface of the structures scanning transverse to the waveguide propagation direction. Single mode channel waveguides are formed by etching a ridge in Si3N4/SiO2 structures and excited at a wavelength of 833 nm. Measurements of the intensity distribution transverse to a channel waveguide reveal a cosine squared variation of intensity above the ridge region and an exponential decay away from the ridge region, in agreement with theoretical expectations. For more complicated structures, for instance the directional coupler, measurements along the two waveguides of the coupler provide a detailed view of optical power transfer from one waveguide to the other. Measurements also provide a detailed view of the evolution of the optical power in the Y-junction.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Susan M. Lindsay, C. D. Poweleit, David H. Naghski, Gregory N. De Brabander, Joseph T. Boyd, and Howard E. Jackson "Near-field measurements of optical channel waveguides", Proc. SPIE 2535, Near-Field Optics, (6 September 1995); https://doi.org/10.1117/12.218698
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