Novel ellipsometer design for the study of large thin films

Yao Lin

doi:10.1117/12.218655

6 September 1995 Novel ellipsometer design for the study of large thin films

Yao Lin

Proceedings Volume 2542, Optomechanical and Precision Instrument Design; (1995) https://doi.org/10.1117/12.218655
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

This paper describes a novel long-scanning reflection ellipsometer to characterize large thin films. The ellipsometer uses a frequency stabilize Zeeman-split He-Ne laser as the source. Two common-path left and right circularly polarized beams, with a slight frequency difference, work as the incident beams. Beat frequency signals are detected from the reflected beams on a sample, and the thin film properties are studied. An optical common-mode rejection technique is employed to minimize the effects of environmental conditions. Measurements are not sensitive to low frequency noise and ignore any electronic dc offset effects. The variaitons of the beam intensities of the source do not affect the experimental results. The optical system is designed to be arranged on a long air-bearing slide with an autofocus system of 0.1 micrometers resolution in the range of 25 mm. Measurements will cover the range from 3 micrometers to 600 mm. Experimental results can be taken in the ordinary experimental conditions.

Citation Download Citation

Yao Lin "Novel ellipsometer design for the study of large thin films", Proc. SPIE 2542, Optomechanical and Precision Instrument Design, (6 September 1995); https://doi.org/10.1117/12.218655

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