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2 August 1995 Computerized interferometric measurement of surface microstructure
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Proceedings Volume 2576, International Conference on Optical Fabrication and Testing; (1995)
Event: International Conferences on Optical Fabrication and Testing and Applications of Optical Holography, 1995, Tokyo, Japan
Nearly all modern high-quality measuring instruments now use micro computers for the collection and analysis of data. This paper describes a computerized interferometric microscope system for the measurement of surface microstructure. For the instrument described in this paper the surface microstructure can be measured at data array sizes as large as 739 X 484 points for measurement fields ranging from 30 X 25 microns to 8.2 X 6.1 mm. A repeatability of the surface height measurements of less than 0.1 nm can be obtained for smooth surfaces. Surfaces having height variances as large as 500 microns can be measured to within an accuracy of a few nanometers.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James C. Wyant "Computerized interferometric measurement of surface microstructure", Proc. SPIE 2576, International Conference on Optical Fabrication and Testing, (2 August 1995);

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