Planar waveguide fabrication by electron beam bombardment of silica

James M. Kubik; A. M. Ali; David B. Patterson

doi:10.1117/12.216796

18 August 1995 Planar waveguide fabrication by electron beam bombardment of silica

James M. Kubik, A. M. Ali, David B. Patterson

Proceedings Volume 2622, Optical Engineering Midwest '95; (1995) https://doi.org/10.1117/12.216796
Event: Optical Engineering Midwest '95, 1995, Chicago, IL, United States

Abstract

We describe a new fabrication technology for silica-based integrated optical components that employs electron irradiation to modify the refractive index of an amorphous SiO₂ substrate. An asymmetric planar waveguide has been fabricated with this method, with a guide depth of approximately 5 micrometers and a core-cladding index difference on the order of 10^-3. The guide is single-moded over the entire visible spectrum, exhibiting losses of less than 12 dB/cm.

Citation Download Citation

James M. Kubik, A. M. Ali, and David B. Patterson "Planar waveguide fabrication by electron beam bombardment of silica", Proc. SPIE 2622, Optical Engineering Midwest '95, (18 August 1995); https://doi.org/10.1117/12.216796

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available