SCA and SPV in line monitoring

Kathy Barla; D. Levy; A. Fleury; J. P. Reynard; L. Kwakman

doi:10.1117/12.221309

19 September 1995 SCA and SPV in line monitoring

Kathy Barla, D. Levy, A. Fleury, J. P. Reynard, L. Kwakman

Proceedings Volume 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing; (1995) https://doi.org/10.1117/12.221309
Event: Microelectronic Manufacturing '95, 1995, Austin, TX, United States

Abstract

In an industrial environment, new techniques based on the surface photovoltage measurement (SCA and SPV), are shown to detect sodium, aluminum, iron contamination in the range of E + 10/cm². Variations in the measurements due to wafer samples or oxidation recipe are determined. From these results, a procedure for preparing monitoring samples is established. It is demonstrated that these monitoring tools are useful to monitor equipment but a correlation between the defectivity on a 12 nm gate oxide and SCA and SPV results with the same recipes was not obtained.

Citation Download Citation

Kathy Barla, D. Levy, A. Fleury, J. P. Reynard, and L. Kwakman "SCA and SPV in line monitoring", Proc. SPIE 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing, (19 September 1995); https://doi.org/10.1117/12.221309

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