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19 September 1995 SCA and SPV in line monitoring
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Abstract
In an industrial environment, new techniques based on the surface photovoltage measurement (SCA and SPV), are shown to detect sodium, aluminum, iron contamination in the range of E + 10/cm2. Variations in the measurements due to wafer samples or oxidation recipe are determined. From these results, a procedure for preparing monitoring samples is established. It is demonstrated that these monitoring tools are useful to monitor equipment but a correlation between the defectivity on a 12 nm gate oxide and SCA and SPV results with the same recipes was not obtained.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kathy Barla, D. Levy, A. Fleury, J. P. Reynard, and L. Kwakman "SCA and SPV in line monitoring", Proc. SPIE 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing, (19 September 1995); https://doi.org/10.1117/12.221309
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