Paper
26 September 1995 FIB 601 focused ion beam fabrication of micron-sized apertures for the NASA AXAF x-ray telescope prelaunch calibration
Author Affiliations +
Proceedings Volume 2640, Microlithography and Metrology in Micromachining; (1995) https://doi.org/10.1117/12.222637
Event: Micromachining and Microfabrication, 1995, Austin, TX, United States
Abstract
Focused ion-beams have proved to be a superior means of fabricating holes between 5 and 20 microns in diameter, through gold and tungsten sheets over 40 microns thick. These holes are milled with an FEI FIB800 Focused Ion Beam Workstation using a Ga liquid metal source, with and without an enhancement gaseous etchant. They will be used as apertures for detectors that probe the point response function of the X-ray optics (Wolter Type-I mirror pairs), which form part of the NASA Advanced X-ray Astrophysical Facility. It is found that both pure milling and gas-assisted etching produced micron-sized holes of a quality superior to those produced by laser beam sputtering.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eugene Y. Tsiang, Edwin M. Kellogg, and Don Porterfield "FIB 601 focused ion beam fabrication of micron-sized apertures for the NASA AXAF x-ray telescope prelaunch calibration", Proc. SPIE 2640, Microlithography and Metrology in Micromachining, (26 September 1995); https://doi.org/10.1117/12.222637
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KEYWORDS
Gold

Ion beams

Sputter deposition

Tungsten

Etching

X-rays

Calibration

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