Optical methods for characterization of MEMS device motion

Phyllis R. Nelson; Patrick B. Chu; Kristofer S. J. Pister

doi:10.1117/12.222656

26 September 1995 Optical methods for characterization of MEMS device motion

Phyllis R. Nelson, Patrick B. Chu, Kristofer S. J. Pister

Proceedings Volume 2640, Microlithography and Metrology in Micromachining; (1995) https://doi.org/10.1117/12.222656
Event: Micromachining and Microfabrication, 1995, Austin, TX, United States

Abstract

Micro-electromechanical system (MEMS) devices are small compared to normal mechanical devices, but they are still large compared to the wavelength of visible light. Thus, simple low- cost optical measurement techniques can be adapted for precise characterization of the motions of these small objects. The results of such measurements are important for verification of simulations, especially for devices in which nonlinear effects such as squeeze film damping play a significant role. The advantages and challenges of optical metrology for MEMS are examined using an electrostatically-actuated microgripper structure as an example device. Interferometric measurements of static rotation and of small-signal sinusoidal and impulse responses are presented.

Citation Download Citation

Phyllis R. Nelson, Patrick B. Chu, and Kristofer S. J. Pister "Optical methods for characterization of MEMS device motion", Proc. SPIE 2640, Microlithography and Metrology in Micromachining, (26 September 1995); https://doi.org/10.1117/12.222656

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