Dual-wavelength laser by selective intermixing of GaAs/AlGaAs quantum wells

Decai Sun; K. J. Beernink; Robert L. Thornton; David W. Treat

doi:10.1117/12.237674

10 April 1996 Dual-wavelength laser by selective intermixing of GaAs/AlGaAs quantum wells

Decai Sun, K. J. Beernink, Robert L. Thornton, David W. Treat

Proceedings Volume 2683, Fabrication, Testing, and Reliability of Semiconductor Lasers; (1996) https://doi.org/10.1117/12.237674
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

The longer-wavelength quantum well in an AlGaAs/GaAs asymmetric dual quantum well laser structure was selectively removed by localized intermixing. High Si-doping on each side of the longer-wavelength well caused intermixing during an anneal under a SiN_x cap, while leaving the other nearby well intact. During an anneal under an exposed GaAs surface layer, both quantum wells remained intact. By patterning the surface with alternating SiN_x and exposed GaAs, the longer-wavelength quantum well was selectively intermixed under the SiN_x. Integrated broad area lasers were fabricated with threshold current density and external quantum efficiency of 260 A/cm² and 30%/facet at a wavelength of 751 nm in capped regions and 195 A/cm², 32%/facet at 824 nm in the uncapped regions. This technique can be used to fabricate close spacing multi-wavelength laser arrays.

Citation Download Citation

Decai Sun, K. J. Beernink, Robert L. Thornton, and David W. Treat "Dual-wavelength laser by selective intermixing of GaAs/AlGaAs quantum wells", Proc. SPIE 2683, Fabrication, Testing, and Reliability of Semiconductor Lasers, (10 April 1996); https://doi.org/10.1117/12.237674

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